Design ULVLED stepper with programmable reflective display panel as mask for multiple process wafer

Jiun-Woei Huang; Chih-Kung Lee

doi:10.1117/12.2583817

22 February 2021 Design ULVLED stepper with programmable reflective display panel as mask for multiple process wafer

Jiun-Woei Huang, Chih-Kung Lee

Proceedings Volume 11613, Optical Microlithography XXXIV; 116130Q (2021) https://doi.org/10.1117/12.2583817
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

In making sensors require multiple processing by using different masks to accomplish, it needs reload and multiple aligning for a wafer in order to make a functional wafer, thus, the consuming for making mask are wasted, and used lamps toxic. In the study, a ULVLED stepper with Programmable LCoS or DLP as mask for multiple process wafer is proposed. By a programmable ultraviolet light-emitting diode (UVLED) array with a collimated lens as a transfer lens forms uniform source, to expose programmable LCoS or DLP as mask by using a 1 to 1 lithographic lens. Sensors and optical binary lens are easily made.

Citation Download Citation

Jiun-Woei Huang and Chih-Kung Lee "Design ULVLED stepper with programmable reflective display panel as mask for multiple process wafer", Proc. SPIE 11613, Optical Microlithography XXXIV, 116130Q (22 February 2021); https://doi.org/10.1117/12.2583817

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