Direct laser writing using a planar diffractive lens optimized by genetic algorithm

Kai Xu; Liang Wang

doi:10.1117/12.2577611

5 March 2021 Direct laser writing using a planar diffractive lens optimized by genetic algorithm

Kai Xu, Liang Wang

Proceedings Volume 11674, Laser-based Micro- and Nanoprocessing XV; 1167413 (2021) https://doi.org/10.1117/12.2577611
Event: SPIE LASE, 2021, Online Only

Abstract

Direct laser writing commonly uses high numerical objective oil lens and femtosecond lasers to realize high precision micro-nano fabrication. Here we report a simple maskless lithography system utilizing a controllably designed high NA planar diffractive lens based on binary amplitude modulation and a diode laser at 405nm wavelength to realize submicron far-field lithography. The design procedure is based on vectorial Rayleigh-Sommerfeld diffraction integrals and genetic algorithm realized by Matlab programming language. The planar diffractive lens reported here can be designed to produce a tightly focused spot (~300-800nm) with an ultra-long depth of focus(~4μm) at a focal length of 1mm.

Conference Presentation

Citation Download Citation

Kai Xu and Liang Wang "Direct laser writing using a planar diffractive lens optimized by genetic algorithm", Proc. SPIE 11674, Laser-based Micro- and Nanoprocessing XV, 1167413 (5 March 2021); https://doi.org/10.1117/12.2577611

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