Effect of wrinkles on pellicle reflectivity and local critical dimension

Dong gi Lee; Young Woong Kim; Seungchan Moon; Jinho Ahn

doi:10.1117/12.2600988

28 September 2021 Effect of wrinkles on pellicle reflectivity and local critical dimension

Dong gi Lee, Young Woong Kim, Seungchan Moon, Jinho Ahn

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118541H (2021) https://doi.org/10.1117/12.2600988
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Conference Poster

Abstract

Even though the EUV pellicle has less than 0.04% EUV reflectivity, it could be locally increased at wrinkles on the pellicle and the intensified light could cause a local CD variation. we confirmed that the reflectivity was increased by more than 4 times due to the pellicle wrinkle and it caused the mask CD variation. Therefore, although the pellicle satisfies the EUV reflectivity requirement, we also need to qualify the wrinkle of the pellicle for the CD variation issue during the exposure process.

Conference Presentation

Citation Download Citation

Dong gi Lee, Young Woong Kim, Seungchan Moon, and Jinho Ahn "Effect of wrinkles on pellicle reflectivity and local critical dimension", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118541H (28 September 2021); https://doi.org/10.1117/12.2600988

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