Presentation + Paper
4 March 2022 Low loss titanium dioxide strip loaded waveguide on thin-film lithium niobate at 1550nm
Author Affiliations +
Proceedings Volume 11997, Optical Components and Materials XIX; 1199705 (2022) https://doi.org/10.1117/12.2614601
Event: SPIE OPTO, 2022, San Francisco, California, United States
Abstract
This paper presents the use of TiO2 as a strip loaded waveguide on thin-film lithium niobate (TFLN). The waveguides were fabricated by using an RF reactive sputtering deposition followed by a dielectric lift-off process. An additional layer of SiO2 was deposited as a cladding layer using a plasma-enhanced chemical vapor deposition (PECVD). To characterize this process, atomic-force-microscopy (AFM) and an ellipsometer were used. Lastly, a propagation loss of 1.26dB/cm at 1550nm was experimentally measured by Optical Backscatter reflectometry (OBR) and are presented in this paper.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaofeng Zhu, Andrew J. Mercante, Shouyuan Shi, Yao Peng, and Dennis W. Prather "Low loss titanium dioxide strip loaded waveguide on thin-film lithium niobate at 1550nm", Proc. SPIE 11997, Optical Components and Materials XIX, 1199705 (4 March 2022); https://doi.org/10.1117/12.2614601
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KEYWORDS
Waveguides

Lithium niobate

Thin films

Photoresist materials

Wave propagation

Sputter deposition

Surface roughness

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