Smart down-sampling using SONR

Rehab Kotb Ali; Le Hong

doi:10.1117/12.2614609

26 May 2022 Smart down-sampling using SONR

Rehab Kotb Ali, Le Hong

Proceedings Volume 12052, DTCO and Computational Patterning; 120520N (2022) https://doi.org/10.1117/12.2614609
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

In this paper, we are presenting a smart and efficient methodology to select the most representative patterns on the wafer. Calibre-SONR is doing Smart down-sampling to patterns on the wafer based on their features and choose the most representative ones to be used in different applications. In addition, it gives the user the flexibility to choose the range of needed representative patterns to tune their models on. A comparison between SONR down-sampling and typical offthe- shelf down-sampling and clustering techniques is done. SONR gives better coverage to the unique patterns than other techniques and able to handle larger data sets.

Conference Presentation

Citation Download Citation

Rehab Kotb Ali and Le Hong "Smart down-sampling using SONR", Proc. SPIE 12052, DTCO and Computational Patterning, 120520N (26 May 2022); https://doi.org/10.1117/12.2614609

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available