Nanofabrication and -metrology by using the nanofabrication machine (NFM-100)

Ingo Ortlepp; Jaqueline Stauffenberg; Anja Krötschl; Denis Dontsov; Jens-Peter Zöllner; Steffen Hesse; Christoph Reuter; Steffen Strehle; Thomas Fröhlich; Ivo W. Rangelow; Eberhard Manske

doi:10.1117/12.2615118

25 May 2022 Nanofabrication and -metrology by using the nanofabrication machine (NFM-100)

Ingo Ortlepp, Jaqueline Stauffenberg, Anja Krötschl, Denis Dontsov, Jens-Peter Zöllner, Steffen Hesse, Christoph Reuter, Steffen Strehle, Thomas Fröhlich, Ivo W. Rangelow, Eberhard Manske

Author Affiliations +

Proceedings Volume 12054, Novel Patterning Technologies 2022; 120540A (2022) https://doi.org/10.1117/12.2615118
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

The feature dimensions of integrated circuits are becoming smaller and the fabrication, metrology and inspection is becoming harder to be fulfilled. Fast-writing of long respectively large nano-features with Scanning-ProbeLithography and their inspection with an Atomic Force Microscope (AFM) is a challenge, for the accomplishment of which the Nanofabrication Machine (NFM-100) can serve as a beneficial experimental platform for basic research in the field of scale-spanning nanomeasuring and nanofabrication. The NFM-100 has an integrated tipbased system, which can be used as an AFM as well as for Field-Emission Scanning Probe Lithography (FESPL). The combination of both systems offers the possibility to fabricate and analyze micro- and nanostructures with high resolution and precision down to a single nanometre over a large area of 100 mm in diameter in a single configuration without tool or sensor change. Thus, in contrast to conventional optical inspection and alignment systems, the NFM-100 offers the potential for full lithographic and metrological automation. For FESPL, the implemented active probes enable an in-situ inspection capability, a quantitative mapping at unprecedented resolution, as well as an integrated overlay alignment system. In this paper, the basic set-up of the NFM-100 as well as the capability of the system for long range AFM scans and FESPL is demonstrated.

Conference Presentation

Citation Download Citation

Ingo Ortlepp, Jaqueline Stauffenberg, Anja Krötschl, Denis Dontsov, Jens-Peter Zöllner, Steffen Hesse, Christoph Reuter, Steffen Strehle, Thomas Fröhlich, Ivo W. Rangelow, and Eberhard Manske "Nanofabrication and -metrology by using the nanofabrication machine (NFM-100)", Proc. SPIE 12054, Novel Patterning Technologies 2022, 120540A (25 May 2022); https://doi.org/10.1117/12.2615118

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