Paper
15 September 2022 High-brightness LDP source for EUVL mask inspection
Author Affiliations +
Abstract
The Laser-assisted Discharge-produced Plasma (LDP) EUV source has been developed as a light source for actinic mask inspection and beamline application and deployed in the field. LDP EUV source enables to generate high brightness with relatively larger EUV plasma by discharged plasma triggered by laser on one electrode disc which is coated by tin film. As EUVL process is used more in mass-production process, the requirement for EUV source for mask inspection is required more. USHIO LDP source has overcome various issues specialized from LDP source and realized high reliability 24/7 based operation with high brightness maintained. In this session, the following items will be presented. (1) LDP EUV source configuration and operation sequence. (2) LDP EUV source key performance (3) Reliability improvement items. (4) High Brightness Development
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuya Aoki, Yoshihiko Sato, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Akihisa Nagano, Daisuke Yajima, and Noritaka Ashizawa "High-brightness LDP source for EUVL mask inspection", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250I (15 September 2022); https://doi.org/10.1117/12.2642210
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet

Plasma

Inspection

Extreme ultraviolet lithography

Ions

Photomasks

Tin

RELATED CONTENT

LPP light source for actinic HVM inspection applications
Proceedings of SPIE (March 19 2015)
High-radiance LDP source for mask-inspection application
Proceedings of SPIE (March 19 2015)
High-radiance LDP source for mask inspection application
Proceedings of SPIE (April 17 2014)
High-brightness LDP source
Proceedings of SPIE (September 29 2023)
High-brightness LDP source for EUVL mask inspection
Proceedings of SPIE (August 23 2021)

Back to Top