Curvilinear mask process correction with zero additional turnaround time

Noriaki Nakayamada; Haruyuki Nomura; Ryosuke Ueba; Yasuo Kato; Kenichi Yasui

doi:10.1117/12.2658633

30 April 2023 Curvilinear mask process correction with zero additional turnaround time

Noriaki Nakayamada, Haruyuki Nomura, Ryosuke Ueba, Yasuo Kato, Kenichi Yasui

Proceedings Volume 12495, DTCO and Computational Patterning II; 1249507 (2023) https://doi.org/10.1117/12.2658633
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Multi-beam writer endowed photomask manufacturers a freedom in curvilinear design without concern for photomask write time. However, a similar concern is now happening in edge-based Mask Process Correction (MPC). When curvilinear pattern gets MPC, the number of figures tend to increase dramatically and takes longer time to process, just like VSB writer experienced shot count and write time increase before. NuFlare Technology Inc. has been developing inline, pixel-based MPC software and hardware embedded on multi-beam writer. This paper describes how our inline, pixel-based MPC achieves pattern fidelity enhancement and zero additional turn-around-time at the same time.

Conference Presentation

Citation Download Citation

Noriaki Nakayamada, Haruyuki Nomura, Ryosuke Ueba, Yasuo Kato, and Kenichi Yasui "Curvilinear mask process correction with zero additional turnaround time", Proc. SPIE 12495, DTCO and Computational Patterning II, 1249507 (30 April 2023); https://doi.org/10.1117/12.2658633

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