Dissociative photoionization of EUV lithography photoresist models

Marziogiuseppe Gentile; Marius Gerlach; Robert Richter; Michiel J. van Setten; John S. Petersen; Paul van der Heide; Fabian Holzmeier

doi:10.1117/12.2657702

30 April 2023 Dissociative photoionization of EUV lithography photoresist models

Marziogiuseppe Gentile, Marius Gerlach, Robert Richter, Michiel J. van Setten, John S. Petersen, Paul van der Heide, Fabian Holzmeier

Author Affiliations +

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 124980S (2023) https://doi.org/10.1117/12.2657702
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

The dissociative photoionization of tert-butyl methyl methacrylate, a monomer unit found in many ESCAP resists, was investigated in a gas phase photoelectron photoion coincidence experiment employing extreme ultraviolet (EUV) synchrotron radiation at 13.5 nm. It was found that the interaction of EUV photons with the molecules leads almost exclusively to dissociation. However, the ionization can also directly deprotect the ester function, thus inducing the solubility switch wanted in a resist film. These results serve as a building block to reconstruct the full picture of the mechanism in widely used chemically amplified resist thin films, provide a knob to tailor more performant resist materials, and will aid interpreting advanced ultrafast time-resolved experiments.

Conference Presentation

Citation Download Citation

Marziogiuseppe Gentile, Marius Gerlach, Robert Richter, Michiel J. van Setten, John S. Petersen, Paul van der Heide, and Fabian Holzmeier "Dissociative photoionization of EUV lithography photoresist models", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124980S (30 April 2023); https://doi.org/10.1117/12.2657702

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