High throughput fabrication of surface gratings on VCSEL using displacement Talbot lithography

Zhu Shi; Baogang Quan; Fangrong Hu

doi:10.1117/12.2643100

23 January 2023 High throughput fabrication of surface gratings on VCSEL using displacement Talbot lithography

Zhu Shi, Baogang Quan, Fangrong Hu

Proceedings Volume 12556, AOPC 2022: Optoelectronics and Nanophotonics; 125560A (2023) https://doi.org/10.1117/12.2643100
Event: Applied Optics and Photonics China 2022 (AOPC2022), 2022, Beijing, China

Abstract

In this paper, surface grating Vertical Cavity Surface Emitting Laser(VCSEL) are fabricated by displacement Talbot lithography (DTL) exposure technology, and the effects of process parameters and anti-reflection layers on the quality of fabricated surface grating VCSEL are systematically studied. The experimental results show that this process can fabricate surface grating VCSEL with a depth of 20-150 nm. When the exposure dose is 30 mJ·cm^-2, the exposure light intensity is 2 mW·cm^-2, and the developing time is 1 min, the results that meet the experimental requirements are obtained. The experimental results show that the method of surface grating VCSEL fabricated by DTL exposure technology can replace EBL exposure technology. It is of great significance to improve the performance of VCSEL.

Citation Download Citation

Zhu Shi, Baogang Quan, and Fangrong Hu "High throughput fabrication of surface gratings on VCSEL using displacement Talbot lithography", Proc. SPIE 12556, AOPC 2022: Optoelectronics and Nanophotonics, 125560A (23 January 2023); https://doi.org/10.1117/12.2643100

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