Performance of a variable shaped vector scan e-beam system for maskmaking

N. Goto; T. Yuasa; M. Hassel Shearer

doi:10.1117/12.3011926

28 December 2023 Performance of a variable shaped vector scan e-beam system for maskmaking

N. Goto, T. Yuasa, M. Hassel Shearer

Proceedings Volume 12811, Bay Area Chrome Users Society Symposium 1987; 1281103 (2023) https://doi.org/10.1117/12.3011926
Event: 7th Annual BACUS Symposium, 1987, Sunnyvale, CA, United States

Abstract

Electron Beam Lithography has emerged as the predominant tool for high accuracy maskmaking. Two basic types of systems have been developed over the past twenty years for maskmaking operation: Raster scan - spot beam systems such as the MEBES system manufactured by Perkin-Elmer and vector scan shaped beam systems such as the internally used EL series developed by IBM or the JBX-6 series produced by JEOL. In the United States the MEBES system clearly has been the more widely used type for maskmaking. Whereas in Japan, both types of systems are used extensively. Traditionally, the major concern regarding the use of a shaped beam system has been the large volume of pattern data created in transforming CAD data to the E-Beam Scanner format. This problem resulted in extremely long conversion times and because of the large amount of pattern data, long transfer times limited the acceptance of these systems. If these problems could be overcome, the machine accuracies and throughput speeds of the two types should be equal and in some cases the shaped beam vector scan system exceed the performance of a raster scan system for reticle generation. The remainder of this paper will describe improvements made in the JEOL system whereby pattern data is translated into machine format by hardware at the time of write as opposed to preprocessing of the data in software. The resultant improvements in system performance will be described and compared to a raster scan system.

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N. Goto, T. Yuasa, and M. Hassel Shearer "Performance of a variable shaped vector scan e-beam system for maskmaking", Proc. SPIE 12811, Bay Area Chrome Users Society Symposium 1987, 1281103 (28 December 2023); https://doi.org/10.1117/12.3011926

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KEYWORDS

Electron beam lithography

Data conversion

Reticles

Raster graphics

Control systems

Vestigial sideband modulation

Computer aided design

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