NIL mastering using advanced manufacturing imaging technology

Bríd M. Connolly

doi:10.1117/12.3024870

13 March 2024 NIL mastering using advanced manufacturing imaging technology

Bríd M. Connolly

Proceedings Volume 12914, SPIE AR, VR, MR Invited Talks 2024; 1291412 (2024) https://doi.org/10.1117/12.3024870
Event: SPIE AR | VR | MR, 2024, San Francisco, California, United States

Abstract

For AR/VR/MR, Nanoimprinting technology is being adopted as the lithography process of choice. This is a cost-effective solution offering optimum pattern fidelity, especially for non-Manhattan/Curvilinear structures. The pattern must be created as a 3D profile on a master, which is then used to stamp copies of them on the actual device material. This is achieved at Toppan by using the most advanced in-house owned Ebeam Lithography (EBL) fleet of equipment combined with state-of-the-art etching tools and techniques to meet the special requirements for gratings and metalens applications, for example. We will show the benefits that the well-established industry environment of photomask manufacturing brings to the ARVRMR sector. We will describe how, by using advanced semiconductor photomask imaging technology in a photomask manufacturing environment, we can deliver industrial quality grade master molds repeatedly for ARVRMR applications.

Conference Presentation

Citation Download Citation

Bríd M. Connolly "NIL mastering using advanced manufacturing imaging technology", Proc. SPIE 12914, SPIE AR, VR, MR Invited Talks 2024, 1291412 (13 March 2024); https://doi.org/10.1117/12.3024870

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