Pixel-based data preparation for digital scanner

Yuho Kanaya; Yoji Watanabe; Toshiaki Sakamoto; Yasushi Mizuno; Ryota Matsui; Yosuke Okudaira; Shunsuke Kibayashi; Koshi Komuro; Hiroyuki Tsukamoto; Kazuo Masaki; Soichi Owa; Thomas Koo; David Tseng; Conrad Sorensen; Sujuan Li; Michael Tan; Bryant Lin; Stephen Renwick; Noriyuki Hirayanagi; Bausan Yuan

doi:10.1117/12.2684546

29 September 2023 Pixel-based data preparation for digital scanner

Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Author Affiliations +

Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150G (2023) https://doi.org/10.1117/12.2684546
Event: Photomask Japan 2023, 2023, Online Only

Abstract

Nikon has been developing the Digital Scanner, an optical maskless exposure tool with a DUV light source. The Digital Scanner uses a spatial light modulator and rasterized pattern data, instead of glass photomasks, to project an optical image. The modulator is a micromirror array and each micromirror takes one of two possible states, so the pattern data are essentially equivalent to a one bit per pixel bitmap image. In spite of the one-bit depth input similar to a black-and-white bitmap, the Digital Scanner can control projected patterns in subpixel resolution because the pixel size is chosen to be smaller than the resolution of the projection optics. Besides the projection hardware, we have also developed special pattern data preparation system for the Digital Scanner in order to realize the subpixel controllability. Polygons from GDSII or OASIS files are rasterized by dedicated pixel-based algorithms so that the optical image of the resulting pixel data becomes equivalent to that of input polygons. Another pattern data converter with optical proximity correction (OPC) capability is also being developed and available for large area conversion. We explain the exposure system of the Digital Scanner and report the progress of the pixel-based data preparation system including recent demonstration printing results of exposure data generated by the new converter that has OPC capability.

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Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, and Bausan Yuan "Pixel-based data preparation for digital scanner", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150G (29 September 2023); https://doi.org/10.1117/12.2684546

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KEYWORDS

Scanners

Printing

Optical proximity correction

Spatial light modulators

Semiconducting wafers

Photomasks

Projection systems

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