Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images

Longqaio Zhang; Sikun Li; Hang Zheng; Shuai Yuan; Xiangzhao Wang

doi:10.1117/12.3007756

24 November 2023 Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images

Longqaio Zhang, Sikun Li, Hang Zheng, Shuai Yuan, Xiangzhao Wang

Author Affiliations +

Proceedings Volume 12935, Fourteenth International Conference on Information Optics and Photonics (CIOP 2023); 129353D (2023) https://doi.org/10.1117/12.3007756
Event: Fourteenth International Conference on Information Optics and Photonics (CIOP 2023), 2023, Xi’an, China

Abstract

Due to the multilayer structure of the extreme ultraviolet(EUV) mask, it is easy to produce defects during the fabrication of the EUV mask, resulting in the deformation of the multilayer and thus changing the optical characteristics of the mask. Detection of defects in the EUV mask is one of the challenges of EUV lithography. In this paper, simulation analysis of defect inspection by Fourier ptychography(FP) is performed. The defective mask blanks' aerial images at different illumination angles are simulated. The amplitude and phase of the aerial images are reconstructed using FP. The effects of light source bandwidth, the number of the multilayer, angular deviation, and imaging noise of the reconstructed aerial image are analyzed. The simulation results show that the loss of intensity and phase shift of the aerial images are different with illuminations of different wavelengths. The reconstructed amplitudes of the aerial images are affected by the wavelengths within the EUV bandwidth. The flatness of the top profile of the phase defect is the key factor affecting the aerial images of the mask. Appropriately increasing the number of the multilayer can reduce the loss of intensity of the aerial images. Excessive angular deviation will affect the reconstructed amplitude and phase of the aerial images. Gaussian noise with a specific Signal-Noise Ratio(SNR) reduces the accuracy of the reconstructed amplitude and phase of the aerial images.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Longqaio Zhang, Sikun Li, Hang Zheng, Shuai Yuan, and Xiangzhao Wang "Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images", Proc. SPIE 12935, Fourteenth International Conference on Information Optics and Photonics (CIOP 2023), 129353D (24 November 2023); https://doi.org/10.1117/12.3007756

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