Practical LWR sampling approaches for advanced patterning

Pulkit Saksena; Michael Thompson; Sinan Selcuk; Anupam K. C.; Jonathan Pegan; Alexander Hryn; Jinnie Aloysius; Sandip Argekar; Mohan Yadav; Abhishek Agrawal; Todd Hoppe; Sarthak Havelia; Chris A. Mack; Martin McCallum; Charles Wallace

doi:10.1117/12.3010906

9 April 2024 Practical LWR sampling approaches for advanced patterning

Pulkit Saksena, Michael Thompson, Sinan Selcuk, Anupam K. C., Jonathan Pegan, Alexander Hryn, Jinnie Aloysius, Sandip Argekar, Mohan Yadav, Abhishek Agrawal, Todd Hoppe, Sarthak Havelia, Chris A. Mack, Martin McCallum, Charles Wallace

Author Affiliations +

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129550M (2024) https://doi.org/10.1117/12.3010906
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

CD variation and more specifically, the line edge roughness (LER), on features now dominates the edge placement error (EPE) and can even exceed the overlay error component of EPE as we scale to more advanced process nodes. A method to accurately differentiate between patterning options is required at these dimensions. The measurements must be accurate and not be influenced by the measurement technique or equipment. EUV lithography and the scaling of the dimensions has brought a greater importance to the effects of linewidth roughness (LWR) in device performance. Lithographers today have to spend considerable amounts of time to measure these irregularities coming from stochastic effects as well as chemical reactions, in order to accurately quantify the patterning effects whilst maintaining cost-effectiveness in manufacturing. In this paper we examine usage of unbiased LWR measurements for EUV direct-print patterning of 32nm, 36nm and 72nm pitch gratings to help instruct the proper choice of materials for photolithography, etch process optimization, illumination source selection as well as improved matching of scanner equipment.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Pulkit Saksena, Michael Thompson, Sinan Selcuk, Anupam K. C., Jonathan Pegan, Alexander Hryn, Jinnie Aloysius, Sandip Argekar, Mohan Yadav, Abhishek Agrawal, Todd Hoppe, Sarthak Havelia, Chris A. Mack, Martin McCallum, and Charles Wallace "Practical LWR sampling approaches for advanced patterning", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129550M (9 April 2024); https://doi.org/10.1117/12.3010906

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