Due to its outstanding qualities, including high carrier mobility, a broadband tunable bandgap, and ambient-environment stability, the two-dimensional material palladium diselenide (PdSe2) has garnered considerable interest. The direct synthesis of PdSe2 on a polyimide (PI) substrate using reported methods in literature is challenging, primarily due to the high synthesis temperature requirement of over 250 °C. In this study, we report the direct synthesis of a large-area PdSe2 film on a PI substrate at 150 °C by Plasma-Enhanced Chemical Vapor Deposition (PECVD). The Hall measurement results show that the film prepared on PI substrate has a carrier mobility of 2.4 cm2 V-1 s-1. Our study demonstrates the effectiveness of PECVD as a method to synthesize large-area PdSe2 films at low temperatures, suggesting prospective applications in flexible electronic devices.
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