New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses

Yudong Zhang; Haixing Zou; ZhiJiang Wang

doi:10.1117/12.44824

1 July 1991 New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses

Yudong Zhang, Haixing Zou, ZhiJiang Wang

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44824
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

This family of optical systems is developed from the Wynne-Dyson system, which can be used in UV and deep-UV lithography systems. Its numerical aperture is larger than 0.4, its spectral bandwidth is wide, so the unnarrowed excimer laser or mercury lamp can be used as an illuminator in these lenses and even the through-lens alignment system can be used in the lithography systems in which these lenses are used.

Citation Download Citation

Yudong Zhang, Haixing Zou, and ZhiJiang Wang "New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44824

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