Poly(bis-alkylthio-acetylen): a dual-mode laser-sensitive material

Reinhard R. Baumann; Joachim Bargon; Hans-Klaus Roth

doi:10.1117/12.44831

1 July 1991 Poly(bis-alkylthio-acetylen): a dual-mode laser-sensitive material

Reinhard R. Baumann, Joachim Bargon, Hans-Klaus Roth

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44831
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Patterns of electrically conducting polymers (100 S cm-1) can be obtained by irradiating thin layers of insulating poly (bis-ethylthio-acetylene) (10-14 S cm-1) with 488 nm Ar+-laser or 351 nm XeF-excimer laser radiation. On the other hand this polymer is a suitable material for laser-induced ablation (photodecomposition), whereby this excimer laser patterned insulating polymer can be made conductive by another Ar+-laser afterwards. The conducting tracks have a stable resistivity both in air (without encapsulation) and in moisture at various temperatures and even in corrosive atmospheres. With these techniques, using a computer-controlled linear positioning system, printed microcircuit boards with integrated passive electronic components can be obtained. Surface mounted devices may be integrated into such circuitry using conductive adhesives.

Citation Download Citation

Reinhard R. Baumann, Joachim Bargon, and Hans-Klaus Roth "Poly(bis-alkylthio-acetylen): a dual-mode laser-sensitive material", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44831

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