Process control capability using a diaphragm photochemical dispense system

Terrell D. Cambria; Scott F. Merrow

doi:10.1117/12.46415

1 June 1991 Process control capability using a diaphragm photochemical dispense system

Terrell D. Cambria, Scott F. Merrow

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46415
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

This paper describes the methods and equipment which can be used to optimize the photochemical dispense process from a contamination and process control perspective. It describes the impact of point-of-use (POU) filtration on coating quality and gel removal; compares the performance of bellows and diaphragm pump designs for the dispensing of photoresist; and quantifies defect reduction studies using POU filtration of polyimide and spin-on-glass (SOG) photochemicals.

Citation Download Citation

Terrell D. Cambria and Scott F. Merrow "Process control capability using a diaphragm photochemical dispense system", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46415

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available