Low-loss waveguides on silicon substrates for photonic circuits

Richard L. Davis; Sae H. Lee

doi:10.1117/12.44907

1 September 1991 Low-loss waveguides on silicon substrates for photonic circuits

Richard L. Davis, Sae H. Lee

Proceedings Volume 1474, Optical Technology for Signal Processing Systems; (1991) https://doi.org/10.1117/12.44907
Event: Orlando '91, 1991, Orlando, FL, United States

Abstract

We have developed techniques for fabricating extremely low-loss channel waveguide structures on silicon substrates. We have made and evaluated waveguides consisting of combinations of Corning 7059 glass, phosphorus-doped silica glass (PSG), and boron-doped silica glass (BSG). The waveguides were fabricated on the surfaces of oxidized silicon wafers. The 7059 waveguides were patterned in rf-sputter-deposited films, and the PSG waveguides were made using atmospheric-pressure, chemical vapor deposition (APCVD), low-pressure, chemical vapor deposition (LPCVD), and plasma-enhanced, chemical vapor deposition (PECVD). BSG was used strictly as a cladding layer for many of the waveguides. We present a comparison of the waveguides prepared by these methods, and discuss the processing techniques used to make channel waveguides with propagation losses less than 0.01 dB/cm. The processes we used allowed us to make waveguides with cross-sections ranging from rectangular to nearly circular, and to build multiguide structures with the waveguides stacked vertically or arranged side by side. Applications for these waveguides include low-loss splitters and combiners, high-finesse resonators, switches, and wavelength division multiplexers/demultiplexers.

Citation Download Citation

Richard L. Davis and Sae H. Lee "Low-loss waveguides on silicon substrates for photonic circuits", Proc. SPIE 1474, Optical Technology for Signal Processing Systems, (1 September 1991); https://doi.org/10.1117/12.44907

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