What IS a phase-shifting mask?

David Levenson

doi:10.1117/12.29740

1 March 1991 What IS a phase-shifting mask?

David Levenson

Proceedings Volume 1496, 10th Annual Symp on Microlithography; (1991) https://doi.org/10.1117/12.29740
Event: 10th Annual Symposium on Microlithography, 1990, Sunnyvale, CA, United States

Abstract

The phase shifting mask is a two-layer engineered structure that improves the resolution of microlithography by between 25% and 100% by using interference to cancel some diffraction effects^1,2. Although invented in 1980, this technology has only recently become prominent, mostly because of its potential to produce 16 Mb and 64 Mb DRAM with current i-line projection tools^3,4. In the long run, phase-shifting masks may be used with deep-UV steppers to make structures with critical dimensions down to 0.15 micrometer.

Citation Download Citation

David Levenson "What IS a phase-shifting mask?", Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); https://doi.org/10.1117/12.29740

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