Measurement of phase-shift masks

Fang Cheng Chang; Gordon S. Kino; William K. Studenmund; Stanley S. C. Chim; Ching-Hua Chou

doi:10.1117/12.148974

4 August 1993 Measurement of phase-shift masks

Fang Cheng Chang, Gordon S. Kino, William K. Studenmund, Stanley S. C. Chim, Ching-Hua Chou

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.148974
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

We discuss in this paper the use of the confocal microscope and an interferometric microscope for measurement of phase-shift masks. It is shown that phase measurements are more accurate than intensity measurements for determining the depth and slope of the sides of a notch. Results obtained on an isotropically etched mask, with curved bottom corners, are predicted well by our imaging theory. Solid immersion lens techniques for observing a mask from the flat side are demonstrated.

Citation Download Citation

Fang Cheng Chang, Gordon S. Kino, William K. Studenmund, Stanley S. C. Chim, and Ching-Hua Chou "Measurement of phase-shift masks", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.148974

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