Calibration of lithography simulator by using subresolution patterns

Shay Kaplan; Linard Karklin

doi:10.1117/12.150482

8 August 1993 Calibration of lithography simulator by using subresolution patterns

Shay Kaplan, Linard Karklin

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150482
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

In this paper, we used actual experimental results to calibrate the 3-D lithography simulator SOLID, a lithography simulator with proven ability to accurately simulate sub-resolution patterns. The RS1 Discover DOE software was used to determine optimum values for the uncertain parameters. The tuned simulator was then used to predict behavior both regular and sub-resolution patterns. The simulation results were compared to actual process data for the final verification.

Citation Download Citation

Shay Kaplan and Linard Karklin "Calibration of lithography simulator by using subresolution patterns", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150482

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