New electronic shearing speckle pattern interferometer with continuously variable sensitivity

Nai-Keng Bao; G. C. Jin; Po Sheun Chung

doi:10.1117/12.162091

22 October 1993 New electronic shearing speckle pattern interferometer with continuously variable sensitivity

Nai-Keng Bao, G. C. Jin, Po Sheun Chung

Proceedings Volume 2066, Industrial Optical Sensing and Metrology: Applications and Integration; (1993) https://doi.org/10.1117/12.162091
Event: Optical Tools for Manufacturing and Advanced Automation, 1993, Boston, MA, United States

Abstract

A new Electronic Shearing Speckle Pattern Interferometer (ESSPI) with continuously variable sensitivity is described. This new instrument not only provides variable sensitivity and improved shearing range but it also increases the maximum shearing sensitivity. It will be well suited to nondestructive testing applications in industry.

Citation Download Citation

Nai-Keng Bao, G. C. Jin, and Po Sheun Chung "New electronic shearing speckle pattern interferometer with continuously variable sensitivity", Proc. SPIE 2066, Industrial Optical Sensing and Metrology: Applications and Integration, (22 October 1993); https://doi.org/10.1117/12.162091

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