Novel synthetic aqueous photoresist for CCD micro color filter

Koji Shimomura; Tomoko Otagaki; Yoko Tamagawa; Michiyo Kobayashi; Hiromitsu Aoki; Yoshikazu Sano; Sumio Terakawa

doi:10.1117/12.175395

16 May 1994 Novel synthetic aqueous photoresist for CCD micro color filter

Koji Shimomura, Tomoko Otagaki, Yoko Tamagawa, Michiyo Kobayashi, Hiromitsu Aoki, Yoshikazu Sano, Sumio Terakawa

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175395
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A novel synthetic aqueous photoresist has been developed for CCD micro color filters. The resist consists of four-components methacrylate copolymers as a resin and diazo compound as a photosensitizer. The resist uses water as a solvent and a developer. The performance characteristics of this resist are the sensitivity of less than 100 mJ/cm², the contrast of more than 8 ((gamma) value), the resolution of less than 1.5 micrometers lines and spaces, the thermal stability of 250 degree(s)C (the transmittance of more than 90% at visual wavelength) and the shelf life of more than 10 days at 23 degree(s)C. It is easily dyed and dyefixed. Micro color filters for 1/4 inch CCD successfully fabricated by using this resist.

Citation Download Citation

Koji Shimomura, Tomoko Otagaki, Yoko Tamagawa, Michiyo Kobayashi, Hiromitsu Aoki, Yoshikazu Sano, and Sumio Terakawa "Novel synthetic aqueous photoresist for CCD micro color filter", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175395

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