Optimization Of Photoresist Processing For Step-And-Repeat Exposure Systems

T. P. Shaughnessy; R. L. Ruddell

doi:10.1117/12.958628

5 September 1980 Optimization Of Photoresist Processing For Step-And-Repeat Exposure Systems

T. P. Shaughnessy, R. L. Ruddell

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958628
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

The advent of the step and repeat exposure of integrated circuits demands process optimization in order to effectively utilize the available image resolution and maximize wafer thruput. This can be achieved by characterizing the photoprocess chemistry for step and repeat lithography. To date, exposure optimization has been primarily determined by the considerations of line width and visual appearance of photoresist. This paper suggests a method to characterize various photoresists with respect to UV sensitivity, contrast, and process latitude. The "gamma" function is a convenient method of expressing the sensitivity and contrast of photoresist systems. Gamma is the slope of the minimum versus the maximum exposure time for a given photoresist: y= {log₁₀(D₀/D_i)}^-1 This paper describes the gamma function of several common negative and positive photo-resists obtained with the use of a Mann Type 4800 DSW Wafer Stepper^TM, a new Mann Type 480 Radiometer, and the Nano Spec/AFT thin film measurement tool. Once the chemical "bench mark" of a photoresist is established, the desired attributes of line width and visual characteristics can be achieved within the required chemical constraints.

Citation Download Citation

T. P. Shaughnessy and R. L. Ruddell "Optimization Of Photoresist Processing For Step-And-Repeat Exposure Systems", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958628

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available