Overview of extreme ultraviolet lithography

Frits Zernike

doi:10.1117/12.195842

7 December 1994 Overview of extreme ultraviolet lithography

Frits Zernike

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195842
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

Extreme UV lithography offers the possibility of printing CDs of 100 nm and smaller with a reduction tool. Because of the wavelength used, the optics have to be all-reflecting. The tool depends on multilayer coatings for the mirrors. A laser-produced plasma is being developed as a granular source. The mask also has to be reflecting. Top surface imaging resist will be used. The work here described is being performed in a National Program set up by the U.S. Department of Energy.

Citation Download Citation

Frits Zernike "Overview of extreme ultraviolet lithography", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195842

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