SCALPEL system

Steven D. Berger; Christopher J. Biddick; Myrtle I. Blakey; Kevin J. Bolan; Stephen W. Bowler; Kevin J. Brady; Ron M. Camarda; Wayne F. Connelly; Reginald C. Farrow; Joseph A. Felker; Linus A. Fetter; Lloyd R. Harriott; Harold A. Huggins; Joseph S. Kraus; James Alexander Liddle; Masis M. Mkrtchyan; Anthony E. Novembre; Milton L. Peabody Jr.; Thomas M. Russell; Wayne M. Simpson; Regine G. Tarascon-Auriol; Harry H. Wade; Warren K. Waskiewicz; Pat G. Watson

doi:10.1117/12.195843

7 December 1994 SCALPEL system

Steven D. Berger, Christopher J. Biddick, Myrtle I. Blakey, Kevin J. Bolan, Stephen W. Bowler, Kevin J. Brady, Ron M. Camarda, Wayne F. Connelly, Reginald C. Farrow, Joseph A. Felker, Linus A. Fetter, Lloyd R. Harriott, Harold A. Huggins, Joseph S. Kraus, James Alexander Liddle, Masis M. Mkrtchyan, Anthony E. Novembre, Milton L. Peabody Jr., Thomas M. Russell, Wayne M. Simpson, Regine G. Tarascon-Auriol, Harry H. Wade, Warren K. Waskiewicz, Pat G. Watson

Author Affiliations +

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195843
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

Citation Download Citation

Steven D. Berger, Christopher J. Biddick, Myrtle I. Blakey, Kevin J. Bolan, Stephen W. Bowler, Kevin J. Brady, Ron M. Camarda, Wayne F. Connelly, Reginald C. Farrow, Joseph A. Felker, Linus A. Fetter, Lloyd R. Harriott, Harold A. Huggins, Joseph S. Kraus, James Alexander Liddle, Masis M. Mkrtchyan, Anthony E. Novembre, Milton L. Peabody Jr., Thomas M. Russell, Wayne M. Simpson, Regine G. Tarascon-Auriol, Harry H. Wade, Warren K. Waskiewicz, and Pat G. Watson "SCALPEL system", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195843

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