Novel techniques for the fabrication of ridge waveguides in lithium niobate

Wei-Lin Chen; Der-Jung Chen; Way-Seen Wang

doi:10.1117/12.205035

17 March 1995 Novel techniques for the fabrication of ridge waveguides in lithium niobate

Wei-Lin Chen, Der-Jung Chen, Way-Seen Wang

Proceedings Volume 2401, Functional Photonic Integrated Circuits; (1995) https://doi.org/10.1117/12.205035
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

Single-mode nickel-diffused ridge waveguides in lithium niobate were fabricated by a combination of nickel diffusion and proton-exchanged wet etching techniques. The nickel diffusion is carried out at 800 degree(s)C for 1.5 hr and the ridge pattern fabrication process starts with a masked proton exchange to induce domain inversion in lithium niobate and then followed by etching away the exchanged areas with a mixture of hydrofluoric acid and nitric acid. An alternative sequence of ridge pattern fabrication and nickel diffusion is also investigated. The SEM graphs show that smooth waveguide surface is obtained. The measured output optical intensity profiles of the ridge waveguide were also shown.

Citation Download Citation

Wei-Lin Chen, Der-Jung Chen, and Way-Seen Wang "Novel techniques for the fabrication of ridge waveguides in lithium niobate", Proc. SPIE 2401, Functional Photonic Integrated Circuits, (17 March 1995); https://doi.org/10.1117/12.205035

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