Printability and repair of defects in rim and attenuated phase shift masks

Philip D. Prewett; Zheng Cui; John G. Watson; Brian Martin

doi:10.1117/12.209204

22 May 1995 Printability and repair of defects in rim and attenuated phase shift masks

Philip D. Prewett, Zheng Cui, John G. Watson, Brian Martin

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209204
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Rim and attenuated phase shift masks can extend the range of i-line optical stepper lithography to 0.4 micrometers with enhanced depth of field. The repair of defects through subtractive and additive methods using focused ion beams is critical to the future success of the technology. Printability tests and simulation studies demonstrate the hierarchy of defects in which both rPSM and aPSM types are less tolerant of absorbing/attenuating defects, but more tolerant of clear defects than the corresponding conventional BIM. Repair trials reveal the existence of a new type of post repair defect - the phase trench - but also clearly demonstrate the feasibility of repair using FIB methods.

Citation Download Citation

Philip D. Prewett, Zheng Cui, John G. Watson, and Brian Martin "Printability and repair of defects in rim and attenuated phase shift masks", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209204

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