Comparison of scalar and vector modeling of image formation in photoresist

Chris A. Mack; Ching-Bo Juang

doi:10.1117/12.209270

26 May 1995 Comparison of scalar and vector modeling of image formation in photoresist

Chris A. Mack, Ching-Bo Juang

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209270
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

A comparison is made between several scalar models for the formation of an image in a photoresist film with differing approximations and a vector model. It was found that up to a numerical apertures of 0.7, a full scalar model showed no appreciable deviation from the vector mode. However, when several common assumptions were made to simplify the scalar model, significant errors resulted at a higher numerical apertures.

Citation Download Citation

Chris A. Mack and Ching-Bo Juang "Comparison of scalar and vector modeling of image formation in photoresist", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209270

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