Development of a particle-detection system for phase-shifting masks

Hiroaki Shishido; Shunichi Matsumoto; Yukio Kenbo; Morihisa Hoga; Yasuhiro Koizumi

doi:10.1117/12.240920

7 June 1996 Development of a particle-detection system for phase-shifting masks

Hiroaki Shishido, Shunichi Matsumoto, Yukio Kenbo, Morihisa Hoga, Yasuhiro Koizumi

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240920
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Particles as small as 0.34 micrometers are detected on phase-shifting masks for 0.3 micrometer LSIs by the particle detection system PS-6000. The system detects the forward- scattered light from the particles using illumination through the rear surface of the masks.

Citation Download Citation

Hiroaki Shishido, Shunichi Matsumoto, Yukio Kenbo, Morihisa Hoga, and Yasuhiro Koizumi "Development of a particle-detection system for phase-shifting masks", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240920

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