Novel antireflection method with gradient photoabsorption for optical lithography

Toshihiko P. Tanaka; Naoko Asai; Shou-ichi Uchino

doi:10.1117/12.240926

7 June 1996 Novel antireflection method with gradient photoabsorption for optical lithography

Toshihiko P. Tanaka, Naoko Asai, Shou-ichi Uchino

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240926
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A new concept using the bottom antireflection layer with graded photoabsorption named GALA (gradient absorption layer) is described to resolve the problems with conventional antireflection methods, such as insufficient antireflection, substrate material, and structure dependence. The antireflection layer with high photoabsorption at the bottom eliminates the light reflected from the substrate and the graded photoabsorption suppresses the surface reflection of the layer. This new method can achieve extremely low reflection (less than 3 percent) for all substrates.

Citation Download Citation

Toshihiko P. Tanaka, Naoko Asai, and Shou-ichi Uchino "Novel antireflection method with gradient photoabsorption for optical lithography", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240926

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