SELID: a new 3D simulator for e-beam lithography

Anja Rosenbusch; Nikos Glezos; Magdalena Kalus; Ioannis Raptis

doi:10.1117/12.262829

27 December 1996 SELID: a new 3D simulator for e-beam lithography

Anja Rosenbusch, Nikos Glezos, Magdalena Kalus, Ioannis Raptis

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262829
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

In the e-beam world a simulator, comparable to well established optical simulators, has not been available so far. SELID (Simulation of E-Beam Lithography in 3 Dimensions) closes this gap by providing a comprehensive simulation tool covering most aspects of today's advanced e- beam lithography, such as process optimization and parameter determination for the e-beam proximity effect correction. SELID consists of 4 major parts: the simulation of the exposure step, the post-exposure bake and the resist development, and the analysis part. On output it displays many different views into the exposed image, 2D exposure images, as well as 2D resist profiles and resist structures in full 3D rendering. This paper presents first results using SELID. The application to direct write will be demonstrated. A commercially available positive e-beam resist was used for electron beam direct write lithography applications. Process optimization and the accuracy of the simulator will be demonstrated. Moreover, the agreement between experiment and simulation will be investigated.

Citation Download Citation

Anja Rosenbusch, Nikos Glezos, Magdalena Kalus, and Ioannis Raptis "SELID: a new 3D simulator for e-beam lithography", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262829

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