Etch integration issues in the development of deep submicron contacts utilizing DUV resist and organic BARC

Viswanathan Ramanathan; Shixiong Chen; Kafai Lai; Maureen R. Brongo; Nandasiri Samarakone

doi:10.1117/12.312473

29 June 1998 Etch integration issues in the development of deep submicron contacts utilizing DUV resist and organic BARC

Viswanathan Ramanathan, Shixiong Chen, Kafai Lai, Maureen R. Brongo, Nandasiri Samarakone

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312473
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Deep UV lithography is widely used to print contacts and vias for the 0.25 micrometers process technology and beyond. Although significant improvements in the depth of focus and exposure latitude of the resist systems have been made using optimized resist formulations, their integrity against plasma etch conditions has to be addressed for the successful implementation in deep submicron process flows. In this paper, the first part of the discussion focuses on quantifying the etch rate differences and the impact of resist profile on the etched profile of different commercial DUV resists, using a Magnetically Enhanced Reactive Ion Etch tool with CF₄:CHF₃ and C₄F₈:CHF₃ fluorocarbon etch chemistries. In the second part, sources of critical dimension variations such as iso vs dense contacts, wafer temperature effects during contact etch as well as etch issues related to the integration of BARC at the contact level are discussed.

Citation Download Citation

Viswanathan Ramanathan, Shixiong Chen, Kafai Lai, Maureen R. Brongo, and Nandasiri Samarakone "Etch integration issues in the development of deep submicron contacts utilizing DUV resist and organic BARC", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312473

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available