Paper
25 June 1999 Finite element modeling of SCALPEL masks
Roxann L. Engelstad, Edward G. Lovell, Gerald A. Dicks, Carl J. Martin, Michael P. Schlax, William H. Semke, James Alexander Liddle, Anthony E. Novembre
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Abstract
A virtual mask laboratory has been developed at the UW Computational Mechanics Center to aid in the design and optimization of the SCALPEL mask. Finite element models have been generated to simulate the thermomechanical response of the mask during fabrication, pattern transfer, mounting and exposure. Results on the mask-related distortions can be used to assess image placement accuracy and mask stability; examples of accurate procedures to vectorially sum in-plane distortion maps from the various sources are presented. In addition, experimental methods to provide material properties and stress characterization data are outlined, along with techniques to verify and benchmark the mechanical models.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roxann L. Engelstad, Edward G. Lovell, Gerald A. Dicks, Carl J. Martin, Michael P. Schlax, William H. Semke, James Alexander Liddle, and Anthony E. Novembre "Finite element modeling of SCALPEL masks", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351085
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Cited by 17 scholarly publications.
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KEYWORDS
Photomasks

Charged-particle lithography

Semiconducting wafers

Finite element methods

Silicon

3D modeling

Data modeling

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