Local thermal analysis of reaction and the glass transition in exposed resist

David S. Fryer; Juan J. de Pablo; Paul F. Nealey

doi:10.1117/12.351159

25 June 1999 Local thermal analysis of reaction and the glass transition in exposed resist

David S. Fryer, Juan J. de Pablo, Paul F. Nealey

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351159
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We report the results of an in situ study of reaction and the glass transition in exposed films of positive chemically amplified resists. Local thermal analysis was performed on exposed patterns in thin films of APEX-E. We measure the activation energy of reaction int he exposed resist to be 132 +/- 5 kJ/mol. Post-exposure delay effects were shown to reduce the reaction rate in the pattern by as much as 14 percent. Finally, we used local thermal analysis to determine the effect of reaction on the glass transition temperature in exposed APEX-E. We find that the glass transition temperature increased linearly by as much as 20 degrees C after complete de-protection matrix. We present a detailed examination of the use of differential thermal analysis to study reaction and the glass transition with a local thermal probe.

Citation Download Citation

David S. Fryer, Juan J. de Pablo, and Paul F. Nealey "Local thermal analysis of reaction and the glass transition in exposed resist", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351159

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