Secondary electron spectroscopy for microanalysis and defect review

David C. Joy; Neeraj Khanna; David Braski

doi:10.1117/12.350849

14 June 1999 Secondary electron spectroscopy for microanalysis and defect review

David C. Joy, Neeraj Khanna, David Braski

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350849
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Secondary electron spectra have been obtained from a variety of materials under vacuum conditions similar to those encountered in a conventional scanning electron microscope. Although secondary emission is restricted to the near surface region of a sample, and so would be expected to be affected by the presence of a film of contamination, it is shown that the modifications to the secondary electron spectrum are generally minor in nature and do not make it impossible to associate the spectrum with the underlying material. Secondary electron spectroscopy may provide a method to add a materials classification category to defect review.

Citation Download Citation

David C. Joy, Neeraj Khanna, and David Braski "Secondary electron spectroscopy for microanalysis and defect review", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350849

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