Paper
26 July 1999 Pattern asymmetries in phase-edge imaging
Michael Fritze, Susan G. Cann, Peter W. Wyatt
Author Affiliations +
Abstract
Strong phase-shift methods such as alternating aperture and chromeless edge are resolution-enhancement techniques that promise to extend optical lithography to the 100-nm regime and possibly below.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Fritze, Susan G. Cann, and Peter W. Wyatt "Pattern asymmetries in phase-edge imaging", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354369
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Cited by 1 scholarly publication.
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KEYWORDS
Photomasks

Monochromatic aberrations

Scanning electron microscopy

Etching

Resolution enhancement technologies

Reticles

Critical dimension metrology

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