Imaging interferometric lithography: extending optics to fundamental limits and beyond

Steven R. J. Brueck

doi:10.1117/12.354787

19 July 1999 Imaging interferometric lithography: extending optics to fundamental limits and beyond

Steven R. J. Brueck

Proceedings Volume 3749, 18th Congress of the International Commission for Optics; (1999) https://doi.org/10.1117/12.354787
Event: ICO XVIII 18th Congress of the International Commission for Optics, 1999, San Francisco, CA, United States

Abstract

Optical lithography has been the mainstay VLSI/ULSI manufacturing technique throughout the entire history of the integrated circuit. The "end" of optical lithography has been oft predicted, and just as often proven premature. Even today, despite all the recent investigation of next-generation lithographies (NGL), it now appears certain that optics will be used for 100-nm critical dimensions (CD) and likely, that optical tools will extend at least to initial stages of the 70-nm CD roadmap node as well, cxtending optical lithography to deep sub-wavelength CDs.

Citation Download Citation

Steven R. J. Brueck "Imaging interferometric lithography: extending optics to fundamental limits and beyond", Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); https://doi.org/10.1117/12.354787

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available