Paper
12 November 1999 Performance test and analysis of silicon-based microchannel heat sink
Shung-Wen Kang, Lung Jieh Yang, Chung-Sheng Yu, Jong-Shun Chen
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Abstract
First, a micro cross flow heat sink made of (110)-orientated silicon is fabricated by bulk micromachining, and wafers with hundreds of high aspect ratio channels are bonded together by diffusion bonding with aluminum as medium layers. The core of the micro heat sink is about 0.918 cm-3, and the density of the heat transfer area if 15,294 m2/m3. Using pure water as the working fluid, as the maximum pressure drop reaches 2.47 bar, the flow rate is greater than 4.5 l/min, and that makes the overall heat transfer coefficient up to 24.7 kW/m2K, corresponds to a volumetric heat transfer coefficient of 188.5 MW/m3K. Second, we fabricate a series of 40 micrometers wide and 30 mm long micro channels with different aspect ratio is 12 cm2 (110) silicon wafer area. The silicon is anodic bonded with #7740 Pyrex glass to form the micro channel structure. Using pure water as the working fluid, hydraulic resistance and thermal performance of the micro channel structure are evaluated experimentally. As the maximum pressure drop reaches 3.3 bar, the flow rate is 0.3 l/min, and that make the heat transfer coefficient up to 32,598 W/m2K.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shung-Wen Kang, Lung Jieh Yang, Chung-Sheng Yu, and Jong-Shun Chen "Performance test and analysis of silicon-based microchannel heat sink", Proc. SPIE 3795, Terahertz and Gigahertz Photonics, (12 November 1999); https://doi.org/10.1117/12.370172
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Cited by 2 scholarly publications.
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KEYWORDS
Silicon

Etching

Semiconducting wafers

Diffusion

Microfluidics

High aspect ratio silicon micromachining

Aluminum

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