Advanced writing strategies for high-end mask making

Melchior Lemke; Juergen Gramss; Hans-Joachim Doering; Hans Eichhorn; Gerhard Schubert

doi:10.1117/12.377107

3 February 2000 Advanced writing strategies for high-end mask making

Melchior Lemke, Juergen Gramss, Hans-Joachim Doering, Hans Eichhorn, Gerhard Schubert

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377107
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

In general the writing strategies of the Leica ZBA 320 tool are presented to the audience. Methods to achieve a high productivity in writing masks of the next generation are highlighted. Thus, such writing modes like variable-shaped beam using 6 shape types, vector scan and `writing-on-the- fly' are explained in their inter-action. Our strategies to constantly improve the accuracy parameters, such like n-pass writing and soft boundaries are not only described but also illustrated by our latest application results. Finally data processing by hierarchical data structures as the main factor to support the above-mentioned writing strategies is outlined in this paper.

Citation Download Citation

Melchior Lemke, Juergen Gramss, Hans-Joachim Doering, Hans Eichhorn, and Gerhard Schubert "Advanced writing strategies for high-end mask making", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377107

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