Mask quality (control) evaluation using the Virtual Stepper System (VSS)

Linard Karklin; J. Tracy Weed; Junling Li

doi:10.1117/12.377101

3 February 2000 Mask quality (control) evaluation using the Virtual Stepper System (VSS)

Linard Karklin, J. Tracy Weed, Junling Li

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377101
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

The end of the millennium has seen the IC industry make the transition to the sub-wavelength arena. All indications are that the sub-wavelength environment is here to stay until the next generation lithography becomes available (see figure ).

Citation Download Citation

Linard Karklin, J. Tracy Weed, and Junling Li "Mask quality (control) evaluation using the Virtual Stepper System (VSS)", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377101

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