Pattern transfer distortions in IPL and EPL masks with pattern density gradients

Gary A. Frisque; Edward G. Lovell; Roxann L. Engelstad

doi:10.1117/12.390096

21 July 2000 Pattern transfer distortions in IPL and EPL masks with pattern density gradients

Gary A. Frisque, Edward G. Lovell, Roxann L. Engelstad

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390096
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Stringent error budgets for Next Generation Lithography masks require accurate pattern placement. Therefore, predictions of distortions induced during mask fabrication and usage are needed to optimize processing and exposure conditions. This paper focuses on the in-plane distortions resulting from pattern transfer during the fabrication of ion-beam projection lithography and electron-beam projection lithography stencil masks.

Citation Download Citation

Gary A. Frisque, Edward G. Lovell, and Roxann L. Engelstad "Pattern transfer distortions in IPL and EPL masks with pattern density gradients", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390096

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