Paper
2 June 2000 Is a production-level scanning electron microscope linewidth standard possible?
Author Affiliations +
Abstract
Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 nm and 100 nm linewidths and high aspect ratio structures, the scanning electron microscope (SEM) remains an important metrology tool. This instrument is also extensively used in many phases of semiconductor manufacturing throughout the world. A challenge was recently posed in an article in Semiconductor International. That challenge was to have an accurate, production level, linewidth standard for critical dimension scanning electron microscopes available to the semiconductor industry. The potential for meeting this challenge is explored in this paper.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael T. Postek Jr., Andras E. Vladar, and John S. Villarrubia "Is a production-level scanning electron microscope linewidth standard possible?", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386452
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CITATIONS
Cited by 7 scholarly publications.
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KEYWORDS
Scanning electron microscopy

Metrology

Standards development

Semiconductors

Electron microscopes

Instrument modeling

Calibration

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