Spatial frequency filtering in the pellicle plane

Bruce W. Smith; Hoyoung Kang

doi:10.1117/12.389014

5 July 2000 Spatial frequency filtering in the pellicle plane

Bruce W. Smith, Hoyoung Kang

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389014
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

An approach to spatial frequency filtering is described where 'zero order' mask diffraction information is reduced, enhancing imaging performance. This method of resolution enhancement is accomplished by filtering in an alternative pupil plane of the objective lens, specifically near or beyond the mask pellicle plane. By introducing an angular specific transmission filter into the Fraunhofer diffraction field of the mask, user accessibility is introduced, allowing for a practical approach to frequency filtering. This is accomplished using a specifically designed interference filter coated over a transparent substrate. Analysis of the approach is given along with result from experiments for contact features using a full field high NA 148nm exposure tool.

Citation Download Citation

Bruce W. Smith and Hoyoung Kang "Spatial frequency filtering in the pellicle plane", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389014

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