Annealing studies of solution-deposited ZrO2 thin films on self-assembled monolayers

K. A. Ritley; F. Schreiber; K.-P. Just; Helmut Dosch; T. P. Niesen; F. Aldinger

doi:10.1117/12.408486

29 November 2000 Annealing studies of solution-deposited ZrO₂ thin films on self-assembled monolayers

K. A. Ritley, F. Schreiber, K.-P. Just, Helmut Dosch, T. P. Niesen, F. Aldinger

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408486
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

Thin films of ZrO₂ were deposited from aqueous solution on Si(100) substrates precovered by alkyltrichlorosilane self-assembled monolayers. The interface structure, thermal stability and densification of these films in the temperature range from room temperature to 750 degree(s)C in vacuum were measured using in situ x-ray reflectivity. The growth rate is a nonlinear function of time in solution. Decreasing film thickness and increasing density is found upon annealing up to 750 degree(s)C. A 25 nm film revealed the appearance of a mixed-phase crystalline structure at 800 degree(s)C which disappeared upon cooling. There is no visible evidence of stress-induced microstructural changes, such as peeling or cracking.

Citation Download Citation

K. A. Ritley, F. Schreiber, K.-P. Just, Helmut Dosch, T. P. Niesen, and F. Aldinger "Annealing studies of solution-deposited ZrO₂ thin films on self-assembled monolayers", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408486

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