Is lithography ready for 300 mm?

Alain B. Charles; Clint Haris; Steffen R. Hornig; Dietmar Ganz; Thorsten Schedel; Guenther Hraschan; Wolfram Koestler; John G. Maltabes; Karl E. Mautz; Sebastian Schmidt; Ralf Schuster

doi:10.1117/12.395736

18 August 2000 Is lithography ready for 300 mm?

Alain B. Charles, Clint Haris, Steffen R. Hornig, Dietmar Ganz, Thorsten Schedel, Guenther Hraschan, Wolfram Koestler, John G. Maltabes, Karl E. Mautz, Sebastian Schmidt, Ralf Schuster

Author Affiliations +

Proceedings Volume 4181, Challenges in Process Integration and Device Technology; (2000) https://doi.org/10.1117/12.395736
Event: Microelectronic Manufacturing, 2000, Santa Clara, CA, United States

Abstract

SEMICONDUCTOR300 was the first pilot production facility for 300mm wafers in the world. This company, a joint venture between Infineon Technologies Motorola, started in early 1998 to develop processes and manufacture products using 300mm wafer tool set. The lithography tools include I-line steppers, as I-line scanner, a DUV stepper, and DUV scanners. All of these exposure tools are running in-line with a photoresist coat and develop track. The lithography tools are used to build 64Mb DRAM devices and aggressive test vehicles with design rules of 0.25 micrometers and below, in sufficient quantity to be able to assess the tool readiness. This paper present the history of technical improvements and roadblocks that have occurred on the 300mm lithography tool set since the start-up, and describe a methodology used to assess the tool performance.

Citation Download Citation

Alain B. Charles, Clint Haris, Steffen R. Hornig, Dietmar Ganz, Thorsten Schedel, Guenther Hraschan, Wolfram Koestler, John G. Maltabes, Karl E. Mautz, Sebastian Schmidt, and Ralf Schuster "Is lithography ready for 300 mm?", Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); https://doi.org/10.1117/12.395736

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Lithography

Deep ultraviolet

Photoresist developing

Scanners

Semiconducting wafers

Manufacturing

Photoresist materials

Show All Keywords

Keywords/Phrases

Search In:

Publication Years