Eddy current evaluation for a high-resolution EB system

Naoharu Shimomura; Munehiro Ogasawara; Kiyoshi Hattori; Jun Takamatsu; Hitoshi Sunaoshi; Shusuke Yoshitake; Yuuji Fukudome; Kiminobu Akeno

doi:10.1117/12.410723

22 January 2001 Eddy current evaluation for a high-resolution EB system

Naoharu Shimomura, Munehiro Ogasawara, Kiyoshi Hattori, Jun Takamatsu, Hitoshi Sunaoshi, Shusuke Yoshitake, Yuuji Fukudome, Kiminobu Akeno

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410723
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

A semi-in-lens electron beam (EB) optical system improves the beam resolution. However, the eddy current is induced in the target and deviates the beam position when the stage is moving continuously. We calculated the eddy current distribution by approximating the magnetic field on the target to a Gaussian distribution. In the mask-scan EB column1 the maximum value and the dispersion of the magnetic field on the target are 0.01 T and 30 mm, respectively. The beam shift due to the eddy current flowing in the Cr film on a reticle is 1.5 X 10-11 m at the stage speed of 0.1 m/s. Therefore, the eddy current does not degrade the positional accuracy.

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Naoharu Shimomura, Munehiro Ogasawara, Kiyoshi Hattori, Jun Takamatsu, Hitoshi Sunaoshi, Shusuke Yoshitake, Yuuji Fukudome, and Kiminobu Akeno "Eddy current evaluation for a high-resolution EB system", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410723

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