Aberration measurement using in-situ two-beam interferometry

Joseph P. Kirk; Gerhard Kunkel; Alfred K. K. Wong

doi:10.1117/12.435717

14 September 2001 Aberration measurement using in-situ two-beam interferometry

Joseph P. Kirk, Gerhard Kunkel, Alfred K. K. Wong

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435717
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

A reticle with phase-only blazed gratings of varying azimuthal orientations diffracts light into only two orders, 0 & +1, discretely illuminating a lens pupil. The image of each grating is a sinusoidal interference pattern and is recorded as a surface relief in a highly absorbing photoresist. The maximum image contrast occurs when focus is set such that the RMS wavefront error over the two beams is minimized. This maximum contrast vs focus is recorded by a CCD array mounted on a dark-field optical microscope and the aberrations are obtained from an analysis of this record. Repeatability of equivalent primary aberrations of less than 0.001(lambda) RMS are achieved and used to monitor lens stability.

Citation Download Citation

Joseph P. Kirk, Gerhard Kunkel, and Alfred K. K. Wong "Aberration measurement using in-situ two-beam interferometry", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435717

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